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Applied Surface Science

Volumn 112, Issue , 1997, Pages 176-186

Modeling of germanium atomic-layer-epitaxy

(2) Sugahara, Satoshi a Matsumura, Masakiyo a

a TOKYO INSTITUTE OF TECHNOLOGY (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ADSORPTION; ATOMS; DESORPTION; EPITAXIAL GROWTH; GERMANIUM COMPOUNDS; HYDROCHLORIC ACID; HYDROGEN; KINETIC THEORY; MATHEMATICAL MODELS; MONOLAYERS; SURFACES; THERMODYNAMICS;

ATOMIC LAYER EPITAXY; CHLOROGERMANES; DIMETHYLGERMANE; SELF LIMITING ADSORPTION;

GERMANIUM;

EID: 0031546857 PISSN: 01694332 EISSN: None Source Type: Journal
DOI: 10.1016/S0169-4332(96)01027-6 Document Type: Article

Times cited : (7)

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