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Volumn 272, Issue 2, 1996, Pages 375-385

Ab initio total energy study of adsorption and diffusion on the Si (100) surface

Author keywords

Adsorption; Computer simulation; Silicon; Surface diffusion

Indexed keywords

ADSORPTION; ATOMS; COMPUTER SIMULATION; DIFFUSION; INTERFACIAL ENERGY; SEMICONDUCTING GERMANIUM; SEMICONDUCTING SILICON; SURFACE STRUCTURE;

EID: 0029776656     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/0040-6090(95)06960-7     Document Type: Article
Times cited : (24)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.