Investigation on the oxygen contamination during the deposition of μC-Si:H thin film by VHF-PECVD

Taiyangneng Xuebao/Acta Energiae Solaris Sinica

Volumn , Issue SUPPL., 2003, Pages 5-8

  Yang, Huidong ^a,b   Wu, Chunya ^a   Zhao, Ying ^a   Mai, Yaohua ^a   Zhang, Xiaodan ^a   Xue, Junming ^a   Ren, Huizhi ^a   Geng, Xinhua ^a   Xiong, Shaozhen ^a  

^a NANKAI UNIVERSITY   (China)

^b Wuyi University   (China)

Author keywords

c Si:H; Optical emission spectroscopy; Oxygen contamination; Very high frequency PECVD

Indexed keywords

AMORPHOUS SILICON; HYDROGENATION; OXYGEN; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

MICROCRYSTALLINE SILICON; OXYGEN CONTAMINATION;

THIN FILMS;

EID: 0042023623     PISSN: 02540096     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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