Substrate bias effects on low temperature polycrystalline silicon formation using electron cyclotron resonance SiH4/H2 plasma

Journal of Applied Physics

Volumn 81, Issue 12, 1997, Pages 8035-8039

  Nozawa, Ryoichi ^a   Takeda, Hirohisa ^a   Ito, Masafumi ^a   Hori, Masaru ^a   Goto, Toshio ^a  

^a NAGOYA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 5544322069     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.365408     Document Type: Article

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