Evaluation of elastic properties and temperature effects in Si thin films using an electrostatic microresonator

Journal of Microelectromechanical Systems

Volumn 12, Issue 4, 2003, Pages 524-530

  Jeong, Jeung Hyun ^a   Chung, Sung Hoon ^a,b   Lee, Se Ho ^a,b   Kwon, Dongil ^a  

^a Seoul National University   (South Korea)

^b SAMSUNG Electronics   (South Korea)

Author keywords

Elastic modulus; Microelectromechanical system (MEMS); Oxidation; Resonance frequency; Single crystalline Si; Temperature effect

Indexed keywords

ELASTIC MODULI; ELASTICITY; ELECTROSTATICS; MATHEMATICAL MODELS; MICROMACHINING; NATURAL FREQUENCIES; OXIDATION; RESONATORS; SCANNING ELECTRON MICROSCOPY; SILICON; THERMAL CYCLING; THERMAL EFFECTS;

ELECTROSTATIC MICRORESONATOR; RAYLEIGH ENERGY METHOD;

MICROELECTROMECHANICAL DEVICES;

EID: 0041886895     PISSN: 10577157     EISSN: None     Source Type: Journal    
DOI: 10.1109/JMEMS.2003.811733     Document Type: Article

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