Advanced modeling of silicon oxidation

Microelectronics Reliability

Volumn 38, Issue 2, 1998, Pages 259-264

  Wolters, D R ^a   Zegers Van Duijnhoven, A T A ^a  

^a PHILIPS RESEARCH LABORATORIES   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; SEMICONDUCTOR DEVICE MODELS; SEMICONDUCTOR GROWTH; THERMOOXIDATION;

GROVE MODEL;

SEMICONDUCTING SILICON;

EID: 0031994418     PISSN: 00262714     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0026-2714(97)00041-3     Document Type: Article

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