Novel approach to chemically amplified resist materials for next generation of lithography

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 42, Issue 6 B, 2003, Pages 3877-3880

  Park, Kyoung Sun ^a   Kim, Dae Yong ^b   Choi, Sang Kuk ^b   Suh, Dong Hack ^a  

^a Hanyang University   (South Korea)

^b Electronics and Telecommunications Research Institute (ETRI)   (South Korea)

Author keywords

Chemically amplified resist; Lithography; Nanoparticle; Pattern; Self crosslinking

Indexed keywords

ATOMIC FORCE MICROSCOPY; CROSSLINKING; MOLECULAR ORIENTATION; PATTERN MATCHING; POLYMETHYL METHACRYLATES;

CHEMICALLY AMPLIFIED RESISTS;

PHOTOLITHOGRAPHY;

EID: 0041862478     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.42.3877     Document Type: Conference Paper

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