Electroless metallization of dielectric SiLK surfaces functionalized by viologen

Journal of the Electrochemical Society

Volumn 150, Issue 8, 2003, Pages

  Yu, W H ^a   Zhang, Yan ^a   Kang, E T ^a   Neoh, K G ^a   Wu, S Y ^b   Chow, Y F ^b  

^a NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

^b INSTITUTE OF MICROELECTRONICS   (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CHEMICAL MODIFICATION; ELECTRODEPOSITION; GRAFTING (CHEMICAL); METALLIZING; PALLADIUM; SILICON WAFERS; SINGLE CRYSTALS; SUBSTRATES; SURFACE TOPOGRAPHY; X RAY PHOTOELECTRON SPECTROSCOPY;

ELECTROLESS METALLIZATION; GRAFT MODIFICATION; ULTRAVIOLET INDUCTION; VINYLBENZYL CHLORIDE; VIOLOGEN;

DIELECTRIC FILMS;

EID: 0041707835     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1589022     Document Type: Article

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