Surface chemistry of planarized SiLK-films studied by XPS

Mikrochimica Acta

Volumn 133, Issue 1-4, 2000, Pages 113-117

  Heeg, Jan ^a   Schubert, Ulf ^a   Küchenmeister, Frank ^a  

^a DRESDEN UNIVERSITY OF TECHNOLOGY   (Germany)

Author keywords

Chemical mechanical polishing; Low dielectric constant polymer; Microelectronics; SiLK; X ray photoelectron spectroscopy

Indexed keywords

EID: 0011191020     PISSN: 00263672     EISSN: None     Source Type: Journal    
DOI: 10.1007/s006040070079     Document Type: Article

References (9)

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