Modelling and validation of contributions to stress in the shallow trench isolation process sequence

CMES - Computer Modeling in Engineering and Sciences

Volumn 1, Issue 1, 2000, Pages 64-83

  Garikipati, K ^a   Rao, V S ^b   Hao, M Y ^c   Ibok, E ^c   De Wolf, I ^d   Dutton, R W ^a  

^a STANFORD UNIVERSITY   (United States)

^b SCHLUMBERGER CAMBRIDGE RESEARCH   (United Kingdom)

^c ADVANCED MICRO DEVICES   (United States)

^d IMEC   (Belgium)

Author keywords

Coupled; Diffusion; Finite elements; Mechanics; Reaction

Indexed keywords

EID: 0041118258     PISSN: 15261492     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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