Reactive ion etching of silicon carbide in SF6 gas: Detection of CF, CF2, and SiF2 etch products

Applied Physics Letters

Volumn 79, Issue 7, 2001, Pages 916-918

  Chabert, P ^a   Cunge, G ^b   Booth, J P ^a   Perrin, J ^a  

^a ECOLE POLYTECHNIQUE   (France)

^b Joseph Fourier University   (France)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0040623256     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1395520     Document Type: Article

References (20)

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