Etching of 6H-SiC and 4H-SiC using NF3 in a reactive ion etching system

Journal of the Electrochemical Society

Volumn 143, Issue 5, 1996, Pages 1750-1753

  Casady, J B ^a   Luckowski, E D ^a   Bozack, M ^a   Sheridan, D ^a   Johnson, R W ^a   Williams, J R ^a  

^a AUBURN UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; MORPHOLOGY; NITROGEN COMPOUNDS; REACTIVE ION ETCHING; SCANNING ELECTRON MICROSCOPY; SURFACE STRUCTURE; SURFACES;

ALUMINUM MICROMASKING; CHEMICAL RESIDUE; NITROGEN TRIFLUORIDE;

SILICON CARBIDE;

EID: 0030144647     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1836711     Document Type: Article

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