Comparison of dry etch chemistries for SiC

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 15, Issue 3, 1997, Pages 885-889

  McDaniel, G ^a   Lee, J W ^a   Lambers, E S ^a   Pearton, S J ^a   Holloway, P H ^a   Ren, F ^b   Grow, J M ^c   Bhaskaran, M ^c   Wilson, R G ^d  

^a University of Florida   (United States)

^b LUCENT TECHNOLOGIES   (United States)

^c NEW JERSEY INSTITUTE OF TECHNOLOGY   (United States)

^d Hughes Aircraft Co   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 5844317505     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.580726     Document Type: Review

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