Water vapor uptake in photolithographic polymers observed by infrared near-field scanning optical microscopy in a controlled environment

Journal of Physical Chemistry B

Volumn 107, Issue 21, 2003, Pages 4951-4954

  McDonough, Laurie A ^a,c   Dragnea, Bogdan ^a,d   Preusser, Jan ^a   Leone, Stephen R ^a,c   Hinsberg, William D ^b  

^a UNIVERSITY OF COLORADO   (United States)

^b IBM ALMADEN RESEARCH CENTER   (United States)

^c LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

^d INDIANA UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL MODIFICATION; INFRARED RADIATION; OPTICAL MICROSCOPY; PHOTOLITHOGRAPHY; PHOTORESISTS; STRUCTURE (COMPOSITION); SWELLING; THIN FILMS; VAPORS; WATER ABSORPTION;

INFRARED NEAR FIELD SCANNING OPTICAL MICROSCOPY; OPTICAL CONTRAST; PHOTOLITHOGRAHIC POLYMERS; POLYMETHACRYLIC ACID;

ORGANIC POLYMERS;

EID: 0038201852     PISSN: 15206106     EISSN: None     Source Type: Journal    
DOI: 10.1021/jp022489j     Document Type: Article

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