Do we need a revolution in design and process integration to enable sub-100 nm technology nodes?

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4692, Issue , 2002, Pages 401-404

  Grobman, W ^a  

^a MOTOROLA INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COST EFFECTIVENESS; LITHOGRAPHY; MICROELECTRONICS; PRODUCTIVITY;

INTEGRATED CIRCUIT (IC) INDUSTRY;

INTEGRATED CIRCUIT LAYOUT;

EID: 0036028760     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.475697     Document Type: Conference Paper

References (0)