RET compliant cell generation for sub-130 nm processes

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4692, Issue , 2002, Pages 529-539

  Torres, J A ^a   Chow, D ^a   De Dood, P ^a   Albers, D J ^a  

^a MENTOR GRAPHICS CORPORATION   (United States)

Author keywords

Design Migration; OPC; PSM compliance; Resolution Enhancement; RET; Standard cell generation

Indexed keywords

CRYSTAL DEFECTS; IMAGING SYSTEMS; INTEGRATED CIRCUIT LAYOUT; MASKS; PHASE SHIFT;

RESOLUTION ENHANCEMENT TECHNOLOGIES (RET);

PHOTOLITHOGRAPHY;

EID: 0036031213     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.475688     Document Type: Conference Paper

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