Semiconductor foundry, lithography, and partners

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4691 I, Issue , 2002, Pages

  Lin, B J ^a  

^a NONE

Author keywords

[No Author keywords available]

Indexed keywords

INTEGRATED CIRCUIT MANUFACTURE; MASKS; SILICON WAFERS; TECHNOLOGY;

SEMICONDUCTOR FOUNDRIES;

LITHOGRAPHY;

EID: 0036411707     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (4)

1. B.J. Lin, Journal of Microlithography, Microfabrication, and Microsystems, vol. 1, p. 1, 2002.
2. C. Krautschik et al., SPIE Proceedings vol. 4343, p. 392.
3. M. Switkes and M. Rothschild, this Proceedings and J. Vac. Sci. Technol. B 19(6) Nov/Dec 2001.
4. Y.M. Ham, U.S. Patent no. 5,573,634, 1996.