Improved planar radio frequency inductively coupled plasma configuration in plasma immersion ion implantation

Review of Scientific Instruments

Volumn 74, Issue 5, 2003, Pages 2704-2708

  Tang, D L ^a   Fu, R K Y ^a   Tian, X B ^a   Chu, P K ^a  

^a CITY UNIVERSITY OF HONG KONG   (Hong Kong)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTROMAGNETIC WAVES; ION IMPLANTATION; MAGNETIC FIELD EFFECTS; PERMANENT MAGNETS; PLASMA DENSITY; PLASMA SHEATHS;

PLASMA IMMERSION;

INDUCTIVELY COUPLED PLASMA;

EID: 0037851031     PISSN: 00346748     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1568559     Document Type: Article

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