Effects of variously configured magnets on the characteristics of inductively coupled plasmas

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 17, Issue 4, 1999, Pages 1211-1216

  Hwang, S W ^a   Lee, Y J ^a   Han, H R ^a   Yoo, J B ^a   Yeom, G Y ^a  

^a Sungkyunkwan University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 3843116756     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.581797     Document Type: Article

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