Real-time determination of plasma etch-rate selectivity

Plasma Sources Science and Technology

Volumn 7, Issue 4, 1998, Pages 581-589

  Sarfaty, Moshe ^a,b   Baum, Chris ^a   Harper, Michael ^a   Hershkowitz, Noah ^a   Shohet, J Leon ^a  

^a UNIVERSITY OF WISCONSIN MADISON   (United States)

^b APPLIED MATERIALS INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER CONTROL SYSTEMS; INTERFEROMETRY; LASER DIAGNOSTICS; PERFORMANCE; POLYSILANES; REAL TIME SYSTEMS;

ETCHING SELECTIVITY;

PLASMA ETCHING;

EID: 0032202363     PISSN: 09630252     EISSN: None     Source Type: Journal    
DOI: 10.1088/0963-0252/7/4/015     Document Type: Article

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