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Volumn 532-535, Issue , 2003, Pages 514-518

Nanoepitaxy of SnO2 on α-Al2O3(0 1 2)

Author keywords

Aluminum oxide; Atomic force microscopy; Epitaxy; Halides; Oxygen; Reflection high energy electron diffraction (RHEED); Tin oxides; X ray scattering, diffraction, and reflection

Indexed keywords

ATOMIC FORCE MICROSCOPY; CHEMICAL SENSORS; CHEMICAL VAPOR DEPOSITION; CRYSTAL ORIENTATION; ELECTRIC CONDUCTIVITY; EPITAXIAL GROWTH; GASES; NANOSTRUCTURED MATERIALS; OXYGEN; REFLECTION HIGH ENERGY ELECTRON DIFFRACTION; ULTRATHIN FILMS; X RAY DIFFRACTION ANALYSIS;

EID: 0037508597     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0039-6028(03)00476-X     Document Type: Conference Paper
Times cited : (25)

References (29)
  • 20
    • 0000300191 scopus 로고
    • HurleD.T.J. Amsterdam: Elsevier
    • Suntola T. Hurle D.T.J. Handbook of Crystal Growth. vol. 3:1994;601 Elsevier, Amsterdam.
    • (1994) Handbook of Crystal Growth , vol.3 , pp. 601
    • Suntola, T.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.