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Volumn 532-535, Issue , 2003, Pages 514-518
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Nanoepitaxy of SnO2 on α-Al2O3(0 1 2)
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Author keywords
Aluminum oxide; Atomic force microscopy; Epitaxy; Halides; Oxygen; Reflection high energy electron diffraction (RHEED); Tin oxides; X ray scattering, diffraction, and reflection
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Indexed keywords
ATOMIC FORCE MICROSCOPY;
CHEMICAL SENSORS;
CHEMICAL VAPOR DEPOSITION;
CRYSTAL ORIENTATION;
ELECTRIC CONDUCTIVITY;
EPITAXIAL GROWTH;
GASES;
NANOSTRUCTURED MATERIALS;
OXYGEN;
REFLECTION HIGH ENERGY ELECTRON DIFFRACTION;
ULTRATHIN FILMS;
X RAY DIFFRACTION ANALYSIS;
NANOEPITAXY;
TIN COMPOUNDS;
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EID: 0037508597
PISSN: 00396028
EISSN: None
Source Type: Journal
DOI: 10.1016/S0039-6028(03)00476-X Document Type: Conference Paper |
Times cited : (25)
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References (29)
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