Atomic-layer chemical vapor deposition of SnO2 for gas-sensing applications

Sensors and Actuators, B: Chemical

Volumn 77, Issue 1-2, 2001, Pages 297-300

  Rosental, A ^a   Tarre, A ^a   Gerst, A ^a   Uustare, T ^a   Sammelselg, V ^a  

^a UNIVERSITY OF TARTU   (Estonia)

Author keywords

ALCVD (ALE); Amorphous phase; CO sensing; SFM smoothness; Tin oxide; Ultrathin layers

Indexed keywords

AMORPHIZATION; CHEMICAL VAPOR DEPOSITION; CRYSTAL GROWTH; GLASS; MICROSCOPIC EXAMINATION; SUBSTRATES; TIN COMPOUNDS; ULTRATHIN FILMS;

ATOMIC LAYER CHEMICAL VAPOR DEPOSITION; SCANNING FORCE MICROSCOPY;

CHEMICAL SENSORS;

EID: 0035876173     PISSN: 09254005     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0925-4005(01)00746-8     Document Type: Article

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