-
1
-
-
0037581345
-
-
Hamel J S, Stefanou S, Bain M, Armstrong B M and Gamble H S 2000 IEEE Microw. Guid. Wave Lett. 10 1051
-
2000 IEEE Microw. Guid. Wave Lett.
, vol.10
, pp. 1051
-
-
Hamel, J.S.1
Stefanou, S.2
Bain, M.3
Armstrong, B.M.4
Gamble, H.S.5
-
3
-
-
0032628176
-
-
Wu Y, Gamble H S, Armstrong B M, Fusco V F and Stewart J A C 1999 IEEE Microw. Guid. Wave Lett. 9 10
-
(1999)
IEEE Microw. Guid. Wave Lett.
, vol.9
, pp. 10
-
-
Wu, Y.1
Gamble, H.S.2
Armstrong, B.M.3
Fusco, V.F.4
Stewart, J.A.C.5
-
4
-
-
0032071636
-
-
Heinrich W, Gerdes J, Schmuckle F J, Rheinfelder C and Strohm K 1998 IEEE Trans. Microw. Theory Tech. 46 709
-
(1998)
IEEE Trans. Microw. Theory Tech.
, vol.46
, pp. 709
-
-
Heinrich, W.1
Gerdes, J.2
Schmuckle, F.J.3
Rheinfelder, C.4
Strohm, K.5
-
8
-
-
0038595488
-
-
Wang R, Campbell S A, Tan R, Meyer J and Cai Y 1998 IEEE Topical Meeting on Silicon Monolithic Integrated Circuits in RF Systems (NJ, USA) p 164
-
(1998)
IEEE Topical Meeting on Silicon Monolithic Integrated Circuits in RF Systems (NJ, USA)
, pp. 164
-
-
Wang, R.1
Campbell, S.A.2
Tan, R.3
Meyer, J.4
Cai, Y.5
-
13
-
-
42149098544
-
-
ed E R Weber, A C Beer and R K Willardson (New York: Academic)
-
Hennel A M 1993 Semiconductors and Semimetals vol 38, ed E R Weber, A C Beer and R K Willardson (New York: Academic) p 189-234
-
(1993)
Semiconductors and Semimetals
, vol.38
, pp. 189-234
-
-
Hennel, A.M.1
-
17
-
-
84894606000
-
-
ed R Hull (New York: INSPEC IEE)
-
Mole P J, Rorison J M, del Alamo J A, Lancefield D, Schroeter W and Seibt M 1999 Properties of Crystalline Silicon (EMIS Datareview Series No 20) ed R Hull (New York: INSPEC IEE) p 430
-
(1999)
Properties of Crystalline Silicon (EMIS Datareview Series No 20)
, pp. 430
-
-
Mole, P.J.1
Rorison, J.M.2
Del Alamo, J.A.3
Lancefield, D.4
Schroeter, W.5
Seibt, M.6
-
26
-
-
0004192386
-
-
(Berlin: Springer) (for V)
-
Graff K 2000 Metal Impurities in Silicon-Device Fabrication 2nd edn (Berlin: Springer) p 136 (for V) Graff K 2000 Metal Impurities in Silicon-Device Fabrication 2nd edn (Berlin: Springer) p 141 (for Mn)
-
(2000)
Metal Impurities in Silicon-Device Fabrication 2nd Edn
, pp. 136
-
-
Graff, K.1
-
27
-
-
0004192386
-
-
(Berlin: Springer) (for Mn)
-
Graff K 2000 Metal Impurities in Silicon-Device Fabrication 2nd edn (Berlin: Springer) p 136 (for V) Graff K 2000 Metal Impurities in Silicon-Device Fabrication 2nd edn (Berlin: Springer) p 141 (for Mn)
-
(2000)
Metal Impurities in Silicon-Device Fabrication 2nd Edn
, pp. 141
-
-
Graff, K.1
-
30
-
-
0030422251
-
-
Adegboyega G A, Passari L, Butturi M A, Poggi A and Suzi E 1996 J. Physique III 6 1691
-
(1996)
J. Physique III
, vol.6
, pp. 1691
-
-
Adegboyega, G.A.1
Passari, L.2
Butturi, M.A.3
Poggi, A.4
Suzi, E.5
-
32
-
-
0004005306
-
-
(New York: Wiley)
-
Sze S M 1981 Physics of Semiconductor Devices (New York: Wiley) p 69-70 Graff K 2000 Metal Impurities in Silicon-Device Fabrication 2nd edn (Berlin: Springer) p 24, 29
-
(1981)
Physics of Semiconductor Devices
, pp. 69-70
-
-
Sze, S.M.1
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