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Volumn 11, Issue 3, 2001, Pages
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Unique precursor delivery and control afforded by low-pressure pulsed-CVD process with ultrasonic atomization
a a a |
Author keywords
[No Author keywords available]
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Indexed keywords
ATOMIZATION;
CHEMICAL REACTORS;
FILM GROWTH;
MICROSTRUCTURE;
MORPHOLOGY;
OPTICAL MICROSCOPY;
POROSITY;
SCANNING ELECTRON MICROSCOPY;
ULTRASONICS;
X RAY DIFFRACTION ANALYSIS;
ULTRASONIC ATOMIZATIONS;
CHEMICAL VAPOR DEPOSITION;
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EID: 0034849228
PISSN: 11554339
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1051/jp4:20013146 Document Type: Conference Paper |
Times cited : (6)
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References (13)
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