XAFS characterization of buried SixNyOz samples

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 200, Issue , 2003, Pages 66-72

  Pinakidou, F ^a   Katsikini, M ^a   Paloura, E C ^a  

^a ARISTOTLE UNIVERSITY OF THESSALONIKI   (Greece)

Author keywords

Implantation; NEXAFS; Silicon oxynitride; X ray absorption spectroscopy

Indexed keywords

ABSORPTION SPECTROSCOPY; CHEMICAL BONDS; CRYSTAL DEFECTS; CRYSTAL MICROSTRUCTURE; ION IMPLANTATION; OXYGEN; X RAY SPECTROSCOPY;

X-RAY ABSORPTION SPECTROSCOPY;

SEMICONDUCTING SILICON COMPOUNDS;

EID: 0037244969     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(02)01676-2     Document Type: Conference Paper

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