Oxynitride films formed by low energy NO+ implantation into silicon

Applied Physics Letters

Volumn 69, Issue 15, 1996, Pages 2214-2215

  Diniz, J A ^a   Tatsch, P J ^a   Pudenzi, M A A ^a  

^a UNIVERSITY OF CAMPINAS   (Brazil)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0012722341     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.117169     Document Type: Article

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