Combined NRA, channeling-RBS and FTIR ellipsometry analyses for the determination of the interface and bonding state of thin SiOx and SiNxOy layers

Fresenius' Journal of Analytical Chemistry

Volumn 353, Issue 3-4, 1995, Pages 403-407

  Michelmann, R W ^a   Baumann, H ^a   Markwitz, A ^a   Meyer, J D ^a   Roseler A ^b   Krimmel, E F ^a   Bethge, K ^a  

^a GOETHE UNIVERSITY   (Germany)

^b LEIBNIZ INSTITUT FÜR ANALYTISCHE WISSENSCHAFTEN ISAS E V   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0012722342     PISSN: 09370633     EISSN: 16182650     Source Type: Journal    
DOI: 10.1007/BF00322078     Document Type: Article

References (16)

1. Algorithms for the rapid simulation of Rutherford backscattering spectra