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Volumn 108, Issue 1-2, 1996, Pages 62-64

Investigation of ultra thin SiNxOy layers produced by low-energy ion implantation with NRA and channeling-RBS

Author keywords

[No Author keywords available]

Indexed keywords


EID: 0002086648     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/0168-583X(95)01047-5     Document Type: Article
Times cited : (6)

References (12)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.