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Volumn 108, Issue 1-2, 1996, Pages 62-64
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Investigation of ultra thin SiNxOy layers produced by low-energy ion implantation with NRA and channeling-RBS
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Author keywords
[No Author keywords available]
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Indexed keywords
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EID: 0002086648
PISSN: 0168583X
EISSN: None
Source Type: Journal
DOI: 10.1016/0168-583X(95)01047-5 Document Type: Article |
Times cited : (6)
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References (12)
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