Nitrogen pulsing to modify the properties of titanium nitride thin films sputter deposited

Journal of Materials Science

Volumn 37, Issue 20, 2002, Pages 4327-4332

  Martin, N ^a   Lintymer, J ^a   Gavoille, J ^a   Takadoum, J ^a  

^a Centre National de la Recherche Scientifique   (France)

Author keywords

[No Author keywords available]

Indexed keywords

COLORIMETRY; COMPOSITION; CRYSTALLOGRAPHY; ELECTRIC CONDUCTIVITY MEASUREMENT; MAGNETRON SPUTTERING; NITROGEN; PULSATILE FLOW; SPUTTER DEPOSITION; THIN FILMS; X RAY DIFFRACTION ANALYSIS;

NITROGEN PULSING; SILICON SUBSTRATES;

TITANIUM NITRIDE;

EID: 0037109525     PISSN: 00222461     EISSN: None     Source Type: Journal    
DOI: 10.1023/A:1020600502303     Document Type: Article

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