TiN reactive sputter deposition studied as a function of the pumping speed

Thin Solid Films

Volumn 332, Issue 1-2, 1998, Pages 335-339

  Heuvelman, W M ^a   Helderman, P ^a   Janssen, G C A M ^a   Radelaar, S ^a  

^a DELFT UNIVERSITY OF TECHNOLOGY   (Netherlands)

Author keywords

Barrier; Micro electronics; Reactive sputter deposition; Stoichiometry; Thin films; TiN; Titanium nitride

Indexed keywords

ARGON; ION BOMBARDMENT; MIXTURES; NITROGEN; PARTIAL PRESSURE; SPUTTER DEPOSITION; STOICHIOMETRY; THIN FILMS; TITANIUM NITRIDE;

GAS MIXTURES; REACTIVE SPUTTER DEPOSITION;

AMORPHOUS FILMS;

EID: 0032476248     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(98)01203-6     Document Type: Article

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