Colour control of titanium nitride coatings produced by reactive magnetron sputtering at temperature less than 100°C

Surface and Coatings Technology

Volumn 116-119, Issue , 1999, Pages 278-283

  Roquiny, Ph ^a   Bodart, F ^a   Terwagne, G ^a  

^a UNIVERSITY OF NAMUR   (Belgium)

Author keywords

Colour; Magnetron sputtering; PVD; Thin film; TiN(x)

Indexed keywords

CHEMICAL BONDS; COLOR; DECORATION; MAGNETRON SPUTTERING; OPTICAL VARIABLES MEASUREMENT; SPUTTER DEPOSITION; STOICHIOMETRY; THIN FILMS; TITANIUM NITRIDE; VAPOR DEPOSITION;

PHYSICAL VAPOR DEPOSITION;

INORGANIC COATINGS;

CERAMIC COATING; OPTICAL FEATURE; SPUTTERING; TITANIUM NITRIDE;

EID: 0033369318     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(99)00076-6     Document Type: Conference Paper

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