SCOPUS 정보 검색 플랫폼

Surface and Coatings Technology

Volumn 149, Issue 2-3, 2002, Pages 135-142

A molecular dynamics study of deposition rate dependence of film morphology in the sputtering process

(4) Ju, Shin Pon a Weng, Cheng I a Chang, Jee Gong a Hwang, Chi Chuan a

a NATIONAL CHENG KUNG UNIVERSITY (Taiwan)

Author keywords

Deposition rate; Incident energy; Molecular dynamics; Sputtering

Indexed keywords

DEPOSITION; MOLECULAR DYNAMICS; MORPHOLOGY; SPUTTERING; THIN FILMS;

SHORT-DISTANCE COLLISON;

COATINGS;

DEPOSITION; FILM; MATHEMATICAL MODELING; MORPHOLOGY; SPUTTERING;

EID: 0037080496 PISSN: 02578972 EISSN: None Source Type: Journal
DOI: 10.1016/S0257-8972(01)01445-1 Document Type: Article

Times cited : (13)

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