Optimization of sputtering conditions for protective carbon thin films of rigid disks deposited by FTS

Vacuum

Volumn 51, Issue 4, 1998, Pages 735-740

  Noda, K ^a   Kawanabe, T ^a   Hirata, T ^b   Naoe, M ^c  

^a IBM JAPAN LTD   (Japan)

^b Thin Film Process Soft   (Japan)

^c TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

DURABILITY; HARD DISK STORAGE; MAGNETIC RECORDING; MECHANICAL TESTING; PRESSURE EFFECTS; PROTECTIVE COATINGS; RAMAN SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; SPUTTER DEPOSITION; SURFACE ROUGHNESS; THIN FILMS;

FACING TARGETS SPUTTERING (FTS);

DIAMOND FILMS;

EID: 0032310465     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/s0042-207x(98)00296-6     Document Type: Article

References (4)

1. Uy, J. C., IEEE Trans. Magn., 1990, 26(5), 2897.
2. Merchant, K., Mee, P., Smallen, M. and Smith, S., IEEE Trans. Magn., 1990, 26(5), 2688.
3. Kawanabe, T., Takahashi, T., Hoshi, Y. and Naoe, M., Materials Science and Eng., 1991, A134, 1296.
4. Wang, G., Silversten, J. M., Judy, J. H. and Chen, G.-L., JAP, 1996, 79(8), 5782.