Simulation of the film growth and film-substrate mixing during the sputter deposition process

Surface and Coatings Technology

Volumn 116-119, Issue , 1999, Pages 568-572

  Lugscheider, E ^a   Von Hayn, G ^a  

^a RWTH AACHEN UNIVERSITY   (Germany)

Author keywords

Microstructure; Molecular dynamics; Physical vapour deposition; Simulation; Theoretical method; Thin films

Indexed keywords

ADHESION; COMPUTER SIMULATION; CRYSTAL MICROSTRUCTURE; EVAPORATION; MAGNETRON SPUTTERING; MOLECULAR DYNAMICS; SINGLE CRYSTALS; SPUTTER DEPOSITION; THIN FILMS; VAPOR DEPOSITION;

PHYSICAL VAPOR DEPOSITION;

FILM GROWTH;

EID: 0039763707     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(99)00208-X     Document Type: Article

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