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Volumn 496, Issue 3, 2002, Pages 196-208
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Atomistic simulation of stress effects in a-Si due to low-energy Si impact
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Author keywords
Amorphous thin films; Computer simulations; Ion bombardment; Ion solid interactions; Molecular dynamics; Silicon
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Indexed keywords
AMORPHOUS FILMS;
COMPRESSIVE STRESS;
COMPUTER SIMULATION;
ION BOMBARDMENT;
MOLECULAR DYNAMICS;
SEMICONDUCTING SILICON;
AMORPHOUS THIN FILMS;
ATOMISTIC SIMULATIONS;
THIN FILMS;
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EID: 0037050228
PISSN: 00396028
EISSN: None
Source Type: Journal
DOI: 10.1016/S0039-6028(01)01608-9 Document Type: Article |
Times cited : (11)
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References (49)
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