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Volumn 496, Issue 3, 2002, Pages 196-208

Atomistic simulation of stress effects in a-Si due to low-energy Si impact

Author keywords

Amorphous thin films; Computer simulations; Ion bombardment; Ion solid interactions; Molecular dynamics; Silicon

Indexed keywords

AMORPHOUS FILMS; COMPRESSIVE STRESS; COMPUTER SIMULATION; ION BOMBARDMENT; MOLECULAR DYNAMICS; SEMICONDUCTING SILICON;

EID: 0037050228     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0039-6028(01)01608-9     Document Type: Article
Times cited : (11)

References (49)
  • 36
    • 0008068744 scopus 로고    scopus 로고
    • Ph.D. Thesis, University Kaiserslautern
    • (2000)
    • Koster, M.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.