Preferential sputtering effects in the deposition of TiAl films by filtered cathodic arc deposition

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 129, Issue 2, 1997, Pages 207-209

  Martin, P J ^a   Bendavid, A ^a   Wielunski, L S ^a   Katardjiev, I ^b   Berg, S ^b  

^a CSIRO   (Australia)

^b UPPSALA UNIVERSITY   (Sweden)

Author keywords

[No Author keywords available]

Indexed keywords

FILTERED CATHODIC ARC DEPOSITION; TITANIUM ALUMINIDE;

ALUMINUM; CATHODES; ION BOMBARDMENT; SEGREGATION (METALLOGRAPHY); SPUTTER DEPOSITION; SUBSTRATES; TITANIUM ALLOYS;

METALLIC FILMS;

EID: 0031191219     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(97)00133-X     Document Type: Article

References (21)

1. M. Zlatanovic and P. Stosic, Proc. Plasma Surface Engineering 1988, Garmisch Partenkirchen, Germany (DGM Informationsgesellschaft mbH, Oberursel, 1989) pp. 861-868.
2. W.D. Münz, J. Vac. Sci. Technol. A 4 (1986) 2717.
3. G. Zhuoming, J. Chenghai and Y. Lieyu, Plasma Surface Engineering 1988, Garmisch Partenkirchen, Germany (DGM Informationsgesellschaft mbH, Oberursel, 1989) pp. 535-540.
4. D. Heim, R. Hochreiter, Le Vide 279 (1996) 243.
5. O. Knotek, M. Atzor, F. Jungblut and H.-G. Prengel, Surf. Coat. Technol. 39 (1989) 445.
6. P.J. Martin, R.P. Netterfield and T.J. Kinder, Thin Solid Films 193 (1990) 77.
7. J.P. Biersack, S. Berg and C. Nender, Thin Solid Films 193/194 (1990) 13.
8. S. Berg, I.V. Katardjiev, C. Nender, P. Carlsson, Thin Solid Films 241 (1994) 1.
9. S. Berg and I.V. Katardjiev, J. Vac. Sci. Technol. A 13 (3) 1995.
10. A.G. Dirks, R.A.M. Wolters and A.J.M. Nellissen, Thin Solid Films 193/194 (1990) 201.
11. S.M. Rossnagel, I. Yang and J.J. Cuomo, Thin Solid Films 199 (1991) 59.
12. I.J. Raaijmakers, T. Setalvad, A.S. Bhansali, B.J. Burrow, L. Gutai, K.-B. Kim, J. Electron. Mater. 19 (1990) 1221.
13. J. Kutzner, H.C. Miller, IEEE Trans. Plasma Sci. 17 (1989) 688.
14. J. Kutzner, H.C. Miller, J. Phys. D 25 (1992) 686.
15. H.C. Miller and J. Kutzner, Contrib. Plasma Phys. 31 (1991) 261.
16. V.M. Lunev, V.G. Padalka, V.M. Khoroshikh, Sov. Phys. Tech. Phys. 22 (7) (1977) 858.
17. W. Davis, H.C. Miller, J. Appl. Phys. 40 (1969) 2212.
18. P.J. Martin, A. Bendavid, T.J. Kinder and L. Wielunski, Surf. Coat. Technol., in press.
19. R. Chimizu, Nucl. Instr. and Meth. B 18 (1987) 486.
20. T. Koshikawa, K. Goto, Nucl. Instr. and Meth. B 18 (1987) 504.
21. R. Kelly, Nucl. Instr. and Meth. B 39 (1989) 43.