Filtered cathodic vacuum arc (FCVA) deposition of thin film silicon

Thin Solid Films

Volumn 290-291, Issue , 1996, Pages 299-304

  Bilek, M M M ^a   Milne, W I ^a  

^a UNIVERSITY OF CAMBRIDGE   (United Kingdom)

Author keywords

Silicon; Vacuum arc

Indexed keywords

AMORPHOUS FILMS; DEPOSITION; ELECTRON ENERGY LOSS SPECTROSCOPY; FILM GROWTH; MICROFILM; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SILICON; SUBSTRATES; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

FILTERED CATHODIC VACUUM ARC (FCVA) DEPOSITION;

METALLIC FILMS;

EID: 0030415581     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(96)09180-8     Document Type: Article

References (9)

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