The novel pattern method of low-k hybrid-organic-siloxane-polymer film using X-ray exposure

Thin Solid Films

Volumn 420-421, Issue , 2002, Pages 403-407

  Chang, T C ^a,b   Tsai, T M ^c   Liu, P T ^b   Mor, Y S ^c   Chen, C W ^c   Mei, Y J ^d   Sheu, J T ^e   Tseng, T Y ^c  

^a NATIONAL SUN YAT SEN UNIVERSITY   (Taiwan)

^b NATIONAL NANO DEVICE LABORATORIES   (Taiwan)

^c NATIONAL CHIAO TUNG UNIVERSITY   (Taiwan)

^d CHING YUN UNIVERSITY   (Taiwan)

^e NATIONAL CHI NAN UNIVERSITY   (Taiwan)

Author keywords

Direct patterning; Hybrid organic siloxane polymer; Low k; X Ray

Indexed keywords

INTEGRATED CIRCUIT MANUFACTURE; PERMITTIVITY; PHOTORESISTS; SCANNING ELECTRON MICROSCOPY; SILICONES; X RAYS;

X RAY EXPOSURE;

DIELECTRIC FILMS;

EID: 0037011110     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(02)00940-9     Document Type: Conference Paper

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