Nanometer X-ray lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3891, Issue , 1999, Pages 69-79

  Hartley, Frank T ^a   Malek, Chantal Khan ^a  

^a CALIFORNIA INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

MICROMACHINING; NANOTECHNOLOGY; ULTRAVIOLET RADIATION; ANISOTROPY; ELECTRODEPOSITION; ION BEAM LITHOGRAPHY; MACHINING; MASKS; OPTICAL COATINGS; PHOTORESISTS;

CONFORMAL COATINGS; NANOELECTROMECHANICAL SYSTEMS (NEMS); NANOMETER X RAY LITHOGRAPHY;

X RAY LITHOGRAPHY;

EID: 0033325503     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (24)