Characterization of a low-k organic spin-on-glass as an intermetal dielectric

Surface and Interface Analysis

Volumn 28, Issue 1, 1999, Pages 97-100

  Wang, C Y ^a   Zheng, J Z ^b   Shen, Z X ^a   Xu, Y ^b   Lim, S L ^a   Liu, R ^a   Huan, A C H ^a  

^a NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

^b CHARTERED SEMICONDUCTOR MANUFACTURING LTD   (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

CROSSLINKING; CURING; ELECTRON BEAMS; FOURIER TRANSFORM INFRARED SPECTROSCOPY; ION IMPLANTATION; PLASMA APPLICATIONS; REFRACTIVE INDEX; SECONDARY ION MASS SPECTROMETRY; THERMODYNAMIC STABILITY;

METHYL SILSESQUIOXANE; PLASMA ASHING; SPIN-ON-GLASS (SOG);

DIELECTRIC MATERIALS;

EID: 0032677952     PISSN: 01422421     EISSN: None     Source Type: Journal    
DOI: 10.1002/(SICI)1096-9918(199908)28:1<97::AID-SIA626>3.0.CO;2-M     Document Type: Article

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