Comparative study of hydrido organo siloxane polymer and hydrogen silsesquioxane

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 39, Issue 10, 2000, Pages 5809-5815

  Chung, Sung Woong ^a   Kim, Sun Young ^a   Shin, Joo Han ^a   Kim, Jun Ki ^a   Park, Jinwon ^a  

^a Hynix Semiconductor Inc   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION; DIELECTRIC PROPERTIES OF SOLIDS; ELECTRIC RESISTANCE; ETCHING; FOURIER TRANSFORM INFRARED SPECTROSCOPY; LEAKAGE CURRENTS; OXIDES; PLASMA APPLICATIONS; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTING POLYMERS; TEMPERATURE PROGRAMMED DESORPTION;

FLOWABLE OXIDE; HYDRIDO ORGANO SILOXANE POLYMER; HYDROGEN SILSESQUIOXANE; INTERMETAL DIELECTRIC; THERMAL DESORPTION SPECTROSCOPY;

SEMICONDUCTING FILMS;

EID: 0034291397     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.39.5809     Document Type: Article

References (5)

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