Method for manufacturing nanoscale structures in transition metal layers

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 20, Issue 6, 2002, Pages 2763-2767

  Van Delft, Falco C M J M ^a   Ketelaars, W S M M ^a   Kroon, M ^a   Lambregts, J ^b  

^a PHILIPS RESEARCH LABORATORIES   (Netherlands)

^b OnStream BV   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; DEPOSITION; DIFFRACTION GRATINGS; ELECTRON BEAM LITHOGRAPHY; ELECTROPLATING; HYDROGEN INORGANIC COMPOUNDS; LIGHT TRANSMISSION; MASKS; PHOTOLITHOGRAPHY; SILICON WAFERS; SURFACE ROUGHNESS; TRANSITION METALS;

ELECTRON BEAM WRITING; HYDROGEN SILSESQUIOXANE; NANOSCALE STRUCTURES; TRANSITION METAL LAYERS;

NANOSTRUCTURED MATERIALS;

EID: 0036883162     PISSN: 0734211X     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1526635     Document Type: Article

References (11)

1. F. C. M. J. M. van Delft, J. Magn. Magn. 140, 2203 (1995).
2. F. C. M. J. M. van Delft, Microelectron. Eng. 30, 361 (1996).
3. F. C. M. J. M. van Delft and J. B. Giebers, Microelectron. Eng. 41, 387 (1998).
4. P. J. Silverman, Proc. SPIE 4343, 12 (2001).
5. H. Meiling, J. Benschop, U. Dinger, and P. Kurtz, Proc. SPIE 4343, 38 (2001).
6. M. Kroon, F. C. M. J. M. van Delft, and W. S. M. M. Ketelaars, Proc. SPIE 4688, 922 (2002).
7. H. Namatsu, T. Yamaguchi, M. Nagase, K. Yamasaki, and K. Kurihara, Microelectron. Eng. 41, 331 (1998).
8. F. C. M. J. M. van Delft, J. P. Wetering, A. K. van Langen-Suurling, and J. Romijn, J. Vac. Sci. Technol. B 18, 3419 (2000).
9. B. E. Maile, W. Henschel, H. Kurz, B. Rienks, R. Polman, and P. Kaars, Jpn. J. Appl. Phys., Part 1 39, 6836 (2000).
10. M. Peuker, M. H. Lim, H. I. Smith, R. Morton, A. K. van Langen-Suurling, J. Romijn, E. W. J. M. van der Drift, and F. C. M. J. M. van Delft, Microelectron. Eng. 61/62, 803 (2002).
11. D. L. Olynick E. H. Anderson, B. Harteneck, and E. Veklerov, J. Vac. Sci. Technol. B 19, 2896 (2001).