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Volumn 4688, Issue 2, 2002, Pages 922-931

Manufacturing sub-50 nm gratings using e-beam lithography and electroplating

Author keywords

E beam lithography; Electroplating; EUV gratings; Extreme UV; HSQ; Negative tone resist; Plating base

Indexed keywords

COMPUTER SIMULATION; ELECTRON BEAMS; ELECTROPLATING; IMAGING TECHNIQUES; SILICON WAFERS;

EID: 0036381307     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.472278     Document Type: Conference Paper
Times cited : (1)

References (11)
  • 1
    • 0010484522 scopus 로고    scopus 로고
    • Latest version (2001)
    • International Technology Roadmap for Semiconductors. Latest version (2001) is available online at http://public.itrs.net/Files/2001ITRS/Home.htm
  • 2
    • 0034763264 scopus 로고    scopus 로고
    • Insertion of EUVL into high volume manufacturing
    • Emerging lithographic technologies V
    • P. J. Silverman, "Insertion of EUVL into high volume manufacturing", Proceedings of SPIE Vol. 4343, Emerging lithographic technologies V, p. 12-18 (2001).
    • (2001) Proceedings of SPIE , vol.4343 , pp. 12-18
    • Silverman, P.J.1
  • 3
    • 0034765744 scopus 로고    scopus 로고
    • Progress of the EUVL alpha tool
    • Emerging lithographic technologies V
    • H. Meiling, J. Benschop, U. Dinger, and P. Kurtz., "Progress of the EUVL alpha tool", Proceedings of SPIE Vol. 4343, Emerging lithographic technologies V, p. 38-50 (2001).
    • (2001) Proceedings of SPIE , vol.4343 , pp. 38-50
    • Meiling, H.1    Benschop, J.2    Dinger, U.3    Kurtz, P.4
  • 4
    • 0010440139 scopus 로고    scopus 로고
    • the internet page of Center for X-Ray Optics (CXRO), Materials Sciences Division, Lawrence Berkeley National Laboratory
    • Please consult http:/www-cxro.lbl.gov, the internet page of Center for X-Ray Optics (CXRO), Materials Sciences Division, Lawrence Berkeley National Laboratory.
  • 7
    • 0035758729 scopus 로고    scopus 로고
    • Aerial image sensor for self-calibration of wafer steppers
    • Optical Microlithography XIV
    • T. Hagiwara, H. Mizutani, N. Kondo, J. Inoue, K. Kaneko, and S. Higashibata, "Aerial image sensor for self-calibration of wafer steppers", Proceedings of SPIE Vol. 4346, Optical Microlithography XIV, p. 1635-1643 (2001).
    • (2001) Proceedings of SPIE , vol.4346 , pp. 1635-1643
    • Hagiwara, T.1    Mizutani, H.2    Kondo, N.3    Inoue, J.4    Kaneko, K.5    Higashibata, S.6
  • 8
    • 12844272449 scopus 로고    scopus 로고
    • Nano-patterning of a hydrogen silsesquioxane resist with reduced linewidth fluctuations
    • H. Namatsu, T. Yamaguchi, M. Nagase, K. Yamasaki, and K. Kurihara, "Nano-Patterning of a hydrogen Silsesquioxane resist with reduced linewidth fluctuations", Microelectron. Eng. 41/42 (1998) 331.
    • (1998) Microelectron. Eng. , vol.41-42 , pp. 331
    • Namatsu, H.1    Yamaguchi, T.2    Nagase, M.3    Yamasaki, K.4    Kurihara, K.5
  • 9
    • 0034318652 scopus 로고    scopus 로고
    • Hydrogen silsesquioxane/novolak bilayer resist for high aspect ratio nanoscale electron-beam lithography
    • Nov/Dec
    • F. C. M. J. M. van Delft, J.P. Weterings, A. K. van Langen-Suurling, and J. Romijn, "Hydrogen silsesquioxane/novolak bilayer resist for high aspect ratio nanoscale electron-beam lithography", J. of Vac. Sci. and Technol. B 18(6) Nov/Dec (2000) 3419.
    • (2000) J. of Vac. Sci. and Technol. B , vol.18 , Issue.6 , pp. 3419
    • Van Delft, F.C.M.J.M.1    Weterings, J.P.2    Van Langen-Suurling, A.K.3    Romijn, J.4
  • 10
    • 0034429405 scopus 로고    scopus 로고
    • Sub-10 nm linewidth and overlay performance achieved with a fine-tuned EBPG-5000 TFE electron beam lithography system
    • B. E. Maile, W. Henschel, H. Kurz, B. Rienks, R. Polman, and P. Kaars, "Sub-10 nm linewidth and overlay performance achieved with a fine-tuned EBPG-5000 TFE electron beam lithography system", Jpn. J. Appl. Phys. 39 (2000) 6836, Pt. 1, No. 12B.
    • (2000) Jpn. J. Appl. Phys. , vol.39 , Issue.12 PART 1B , pp. 6836
    • Maile, B.E.1    Henschel, W.2    Kurz, H.3    Rienks, B.4    Polman, R.5    Kaars, P.6
  • 11
    • 0010486169 scopus 로고    scopus 로고
    • note
    • The similarity of HSQ and fused silica (quartz) is was verified for the optical index of refraction by means of variable angle spectroscopic ellipsometry (VASE). VASE measurements were performed by Daniel Miller, International Sematech, Austin, Texas, United States of America.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.