Mechanistic framework for dry etching, beam assisted etching and tribochemical etching

Microelectronic Engineering

Volumn 30, Issue 1-4, 1996, Pages 361-364

  Van Delft, Falco C M J M ^a  

^a PHILIPS RESEARCH LABORATORIES   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; CHLORINE; DRY ETCHING; HYDROCHLORIC ACID; ION BEAMS; IONS; MATHEMATICAL MODELS; PLASMAS; REACTIVE ION ETCHING; SEMICONDUCTING INDIUM PHOSPHIDE; THERMAL EFFECTS;

BEAM ASSISTED ETCHING; LASER CHEMICAL ETCHING; MAGNETIC ALLOYS; REACTIVE ION BEAM ETCHING; TRIBOCHEMICAL ETCHING;

ETCHING;

EID: 0029771237     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/0167-9317(95)00264-2     Document Type: Article

References (14)

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