Properties of silicon (111) and (100) surfaces etched in choline solution

Journal of the Electrochemical Society

Volumn 149, Issue 9, 2002, Pages

  Sakaino, Kaoru ^a   Adachi, Sadao ^a  

^a GUNMA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ADSORPTION; APPROXIMATION THEORY; ATOMIC FORCE MICROSCOPY; ELLIPSOMETRY; ETCHING; HYDROCARBONS; MATHEMATICAL MODELS; REGRESSION ANALYSIS; SURFACE ROUGHNESS;

CHOLINE SOLUTION; SPECTROSCOPIC ELLIPSOMETRY; TRIMETHYLHYDROXYETHYLAMMONIUM HYDROXIDE;

SILICON;

EID: 0036747403     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1498843     Document Type: Article

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