Etching characteristics of Si(100) surfaces in an aqueous NaOH solution

Journal of the Electrochemical Society

Volumn 147, Issue 4, 2000, Pages 1530-1534

  Sakaino, Kaoru ^a   Kawabata, Yuji ^a   Adachi, Sadao ^a  

^a GUNMA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; ELLIPSOMETRY; ETCHING; OXIDES; SODIUM COMPOUNDS; SURFACE ROUGHNESS; SURFACE TREATMENT;

SODIUM HYDROXIDE; SPECTROSCOPIC ELLIPSOMETRY; SURFACE NATIVE OXIDE;

SEMICONDUCTING SILICON;

EID: 0033732939     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1393389     Document Type: Article

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