PECVD-SiOxNy films for large area self-sustained grids applications

Sensors and Actuators, A: Physical

Volumn 100, Issue 2-3, 2002, Pages 295-300

  Carreo, M N P ^a   Alayo, M I ^a   Pereyra, I ^a   Lopes, A T ^b  

^a UNIVERSITY OF SÃO PAULO   (Brazil)

^b Cid Universitat   (Brazil)

Author keywords

Micro electro mechanical system; Plasma CVD; Silicon oxynitride; Thick films

Indexed keywords

ETCHING; FOURIER TRANSFORM INFRARED SPECTROSCOPY; LOW TEMPERATURE EFFECTS; MICROELECTROMECHANICAL DEVICES; MICROMACHINING; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SILICON COMPOUNDS; STRESSES; SUBSTRATES;

SELF-SUSTAINED GRIDS;

THICK FILMS;

EID: 0036727594     PISSN: 09244247     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0924-4247(02)00054-7     Document Type: Article

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