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Volumn 37, Issue 3 A, 1998, Pages
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Significant reduction of impurity contents in hydrogenated microcrystalline silicon films for increased grain size and reduced defect density
a
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Author keywords
[No Author keywords available]
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Indexed keywords
CRYSTAL DEFECTS;
CRYSTAL IMPURITIES;
CRYSTAL STRUCTURE;
ENERGY GAP;
FERMI LEVEL;
GRAIN SIZE AND SHAPE;
HYDROGENATION;
MATHEMATICAL MODELS;
OPTICAL PROPERTIES;
QUARTZ;
SEMICONDUCTING SILICON;
THERMAL EFFECTS;
SCHERRER'S EQUATION;
ULTRAHIGH VACUUM PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;
SEMICONDUCTING FILMS;
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EID: 0032021693
PISSN: 00214922
EISSN: None
Source Type: Journal
DOI: 10.1143/jjap.37.l265 Document Type: Article |
Times cited : (58)
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References (9)
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