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Thin Solid Films

Volumn 337, Issue 1-2, 1999, Pages 7-11

Properties of polycrystalline silicon films prepared from fluorinated precursors

(4) Ray, Swati a Mukhopadhyay, Sumita a Saha, S C a Hazra, Sukti a

a DEPARTMENT OF MATERIALS SCIENCE (India)

Author keywords

Characterization; PECVD; Polycrystalline silicon; Thin film

Indexed keywords

EID: 0007947027 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/S0040-6090(98)01166-3 Document Type: Article

Times cited : (13)

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