Amorphous and microcrystalline silicon films grown at low temperatures by radio-frequency and hot-wire chemical vapor deposition

Journal of Applied Physics

Volumn 86, Issue 7, 1999, Pages 3812-3821

  Alpuim, P ^a   Chu, V ^a   Conde, J P ^b  

^a INESC   (Portugal)

^b INSTITUTO SUPERIOR TÉCNICO   (Portugal)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; AMORPHOUS SILICON; CRYSTALLINE MATERIALS; DENSITY (SPECIFIC GRAVITY); FILM GROWTH; HYDROGENATION; PHOTOCONDUCTIVITY; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; THIN FILMS;

HOT-WIRE CHEMICAL VAPOR DEPOSITION (HW-CVD);

SEMICONDUCTING FILMS;

EID: 0032620083     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.371292     Document Type: Article

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